Sheath model for dual-frequency capacitively coupled plasmas

被引：0
|
作者：
机构：
[1] Denpoh, Kazuki
[2] 1,Wakayama, Go
[3] 1,Nanbu, Kenichi
来源：
Denpoh, K. | 1600年 / Japan Society of Applied Physics卷 / 43期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    王虹宇
    姜巍
    孙鹏
    赵双云
    李阳
    Plasma Science and Technology, 2016, (02) : 143 - 146
  • [22] Dielectric material etch selectivity control in dual-frequency capacitively coupled plasmas with dc-superposition
    Zhang, Du
    Kim, Hojin
    McInerney, Kathleen
    Luan, Pingshan
    Rogalskyj, George
    Wang, Mingmei
    ADVANCED ETCH TECHNOLOGY AND PROCESS INTEGRATION FOR NANOPATTERNING XI, 2022, 12056
  • [23] Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC
    Yamaguchi, Tsuyoshi
    Komuro, Tatsuya
    Koshimizu, Chishio
    Takashima, Seigo
    Takeda, Keigo
    Kondo, Hiroki
    Ishikawa, Kenji
    Sekine, Makoto
    Hori, Masaru
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (02)
  • [24] Ion behavior in capacitively-coupled dual-frequency discharges
    Donko, Zoltan
    RADICALS AND NON-EQUILIBRIUM PROCESSES IN LOW-TEMPERATURE PLASMAS, 2007, 86
  • [25] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    Wang Hongyu
    Jiang Wei
    Sun Peng
    Zhao Shuangyun
    Li Yuang
    PLASMA SCIENCE & TECHNOLOGY, 2016, 18 (02) : 143 - 146
  • [26] Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
    王虹宇
    姜巍
    孙鹏
    赵双云
    李阳
    Plasma Science and Technology, 2016, 18 (02) : 143 - 146
  • [27] Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas
    Ohya, Yoshinobu
    Ishikawa, Kenji
    Komuro, Tatsuya
    Yamaguchi, Tsuyoshi
    Takeda, Keigo
    Kondo, Hiroki
    Sekine, Makoto
    Hori, Masaru
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (15)
  • [28] CHF3 dual-frequency capacitively coupled plasma
    Hu Jia
    Xu Yi-Jun
    Ye Chao
    ACTA PHYSICA SINICA, 2010, 59 (04) : 2661 - 2665
  • [29] Electrode impedance effect in dual-frequency capacitively coupled plasma
    Yamazawa, Yohei
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2015, 24 (03):
  • [30] Effect of high-frequency on etching of SiCOH films in CHF3 dual-frequency capacitively coupled plasmas
    Ye, Chao
    Xu, Yijun
    Huang, Xiaojiang
    Ning, Zhaoyuan
    THIN SOLID FILMS, 2010, 518 (12) : 3223 - 3227
12345