E-beam lithography for digital holograms

被引：0
|
作者：
机构：
来源：
| 1600年 / Publ by Taylor & Francis, Bristol, PA, USA卷 / 40期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Development of a next generation e-beam lithography system
    Nakagawa, Y
    Komagata, T
    Takemura, H
    Gotoh, N
    Tanaka, K
    18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 45 - 54
  • [42] Overcoming pattern collapse on e-beam and EUV lithography
    Jouve, A.
    Simon, J.
    Pikon, A.
    Solak, H.
    Vannuffel, C.
    Tortai, J-H
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U556 - U566
  • [43] Direct Patterning of Ionic Polymers with E-Beam Lithography
    Steinbach, Annina M.
    Jenisch, Stefan
    Bakhtiarpour, Parisa
    Amirkhani, Masoud
    Strehle, Steffen
    MRS ADVANCES, 2016, 1 (01): : 45 - 50
  • [44] New microscopic approach to e-beam lithography simulation
    Sidorov, Fedor
    Rogozhin, Alexander
    2020 VI INTERNATIONAL CONFERENCE ON INFORMATION TECHNOLOGY AND NANOTECHNOLOGY (IEEE ITNT-2020), 2020,
  • [45] Space charge effects in e-beam projection lithography
    Mkrtchyan, M
    Liddle, JA
    Harriott, LR
    Munro, E
    SOLID STATE TECHNOLOGY, 2000, 43 (07) : 241 - +
  • [46] Low energy e-beam proximity projection lithography
    Utsumi, T
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 117 - 125
  • [47] HIGH-VOLTAGE SHAPED E-BEAM LITHOGRAPHY
    JONES, GAC
    SARGENT, PM
    NORRIS, TS
    AHMED, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 124 - 127
  • [48] SURFACE IMAGING AND DRY DEVELOPMENT FOR E-BEAM LITHOGRAPHY
    BAIK, KH
    JONCKHEERE, R
    SEABRA, A
    VANDENHOVE, L
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 269 - 273
  • [49] Patterning of membrane masks for projection e-beam lithography
    Fetter, L
    Biddick, C
    Blakey, M
    Liddle, A
    Peabody, H
    Novembre, A
    Tennant, D
    16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1996, 2884 : 276 - 287
  • [50] Advanced application of hierarchy reorganisation in E-beam lithography
    Rosenbusch, A
    Kalus, CK
    Hofmann, U
    Irmscher, M
    MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 77 - 80
12345