Method to improve field alignment registration accuracy in VLSI lithography

被引：0
|
作者：
Liu, Jianhai [1 ]
Wang, Bin [1 ]
Zhang, Xiaoping [1 ]
Li, Bing-Zong [1 ]
机构：
[1] Advanced Semiconductor Manufacturing, Corp of Shanghai, Shanghai, China
来源：
International Conference on Solid-State and Integrated Circuit Technology Proceedings | 1998年
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页码：109 / 112
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