Langmuir probe studies of a helicon plasma system

被引：0
|
作者：
Schneider, T.P. [1 ]
Dostalik, W.W. [1 ]
Springfield, A.D. [1 ]
Kraft, R. [1 ]
机构：
[1] Silicon Technology Development, Kilby Center, Texas Instruments Inc., 13570 N Central Expressway, Dallas, TX 75243, United States
来源：
Plasma Sources Science and Technology | 1999年 / 8卷 / 03期
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页码：397 / 403
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