Kinetics of reaction at interface of Si3N4/W joint

被引：0
作者：
Shimoo, Toshio [1 ]
Sandjaja, Ari [1 ]
Adachi, Shin-ichiro [1 ]
Okamura, Kiyohito [1 ]
机构：
[1] Univ of Osaka Prefecture, Sakai-shi, Japan
来源：
Journal of the Ceramic Society of Japan. International ed. | 1995年 / 103卷 / 02期
关键词：
Silicon nitride;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
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页码：108 / 112
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