Novel x-ray mask concept for mix&match lithography fabrication of MOS devices by synchrotron radiation lithography

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Istituto di Elettronica dello Stato, Solido-CNR, Rome, Italy [1 ]
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Microelectron Eng | / 1-4卷 / 553-556期
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Number:; -; Acronym:; UW; Sponsor: University of Wisconsin-Madison;
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