XPS study of the SF6 reactive ion beam etching of silicon at low temperatures

被引：0
|
作者：
Tessier, P.Y. [1 ]
Chevolleau, T. [1 ]
Cardinaud, C. [1 ]
Grolleau, B. [1 ]
机构：
[1] Inst. des Matériaux de Nantes, Lab. Plasmas Couches Minces, U., Nantes, France
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1999年 / 155卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：280 / 288
相关论文
共 50 条
  • [21] A MECHANISTIC STUDY OF SF6/O2 REACTIVE ION ETCHING OF MOLYBDENUM
    PARK, SJ
    SUN, CP
    PURTELL, RJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05): : 1372 - 1373
  • [22] ANISOTROPIC AND SELECTIVE REACTIVE ION ETCHING OF POLYSILICON USING SF6
    PARRENS, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1403 - 1407
  • [23] Thermal Reactive Ion Etching of Minor Metals with SF6 Plasma
    Han, Gang
    Murata, Yuki
    Minami, Yuto
    Sohgawa, Masayuki
    Abe, Takashi
    SENSORS AND MATERIALS, 2017, 29 (03) : 217 - 223
  • [24] REACTIVE ION-ETCHING-INDUCED DAMAGE IN SILICON USING SF6 GAS-MIXTURES
    ARORA, BM
    PINTO, R
    BABU, RS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04): : 876 - 882
  • [25] ION-BEAM ASSISTED CHEMICAL ETCHING OF SI BY SF6
    AFFOLTER, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (01): : 19 - 23
  • [26] PHOTOLUMINESCENCE OF DEFECTS INDUCED IN SILICON BY SF6/O-2 REACTIVE-ION ETCHING
    BUYANOVA, IA
    HENRY, A
    MONEMAR, B
    LINDSTROM, JL
    OEHRLEIN, GS
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (05) : 3348 - 3352
  • [27] SILICON ETCHING EMPLOYING NEGATIVE-ION IN SF6 PLASMA
    SHINDO, H
    SAWA, Y
    HORIIKE, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1995, 34 (7B): : L925 - L928
  • [28] Submicrometer transmission mask fabricated by low-temperature SF6/O2 reactive ion etching and focused ion beam
    Sheng, HY
    Fujita, D
    Ohgi, T
    Okamoto, H
    Nejoh, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 2982 - 2985
  • [29] SF6 plasma etching of silicon nanocrystals
    Liptak, R. W.
    Devetter, B.
    Thomas, J. H., III
    Kortshagen, U.
    Campbell, S. A.
    NANOTECHNOLOGY, 2009, 20 (03)
  • [30] Anisotropic etching of silicon in SF6 plasma
    Knizikevicius, R
    Kopustinskas, V
    VACUUM, 2004, 77 (01) : 1 - 4
12345