MOCVD of Ni and Ni3C films from Ni(dmen)2(tfa)2

被引：0
|
作者：
Brissonneau, L. [1 ]
Kacheva, A. [1 ]
Senocq, F. [1 ]
Kang, J.-K. [2 ]
Rhee, S.-W. [2 ]
Gleizes, A. [1 ]
Vahlas, C. [1 ]
机构：
[1] Lab. Interfaces et Matériaux, INPT-CNRS, Ecl. Natl. Sup. de Chim. de Toulouse, 118 route de Narbonne, 31077 Toulouse Cedex 4, France
[2] Lab. of Adv. Materials Processing, Department of Chemical Engineering, Pohang Univ. of Sci. and Technology, San 31 Hyoja-dong, Nam-gu, Pohang, Kyungbuk, Korea, Republic of
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
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页码：8 / 597
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