Copolymers of chloroethyl methacrylate, glycidyl methacrylate, and methyl methacrylate as synchrotron radiation x-ray photoresists

被引：0

作者：

Fang, Yuee ^{[1
]}

Chen, Dapeng ^{[1
]}

Liu, Gang ^{[1
]}

Wang, Bing ^{[1
]}

Shi, Tianyi ^{[1
]}

Hu, Yiguan ^{[1
]}

Tian, Yangchao ^{[1
]}

Kan, Ya ^{[1
]}

机构：

[1] Univ of Science and Technology of, China, Hefei, China

来源：

Chinese Journal of Polymer Science (English Edition) | 1998年 / 16卷 / 04期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：304 / 309

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