Copolymers of chloroethyl methacrylate, glycidyl methacrylate, and methyl methacrylate as synchrotron radiation x-ray photoresists

被引：0
|
作者：
Fang, Yuee [1 ]
Chen, Dapeng [1 ]
Liu, Gang [1 ]
Wang, Bing [1 ]
Shi, Tianyi [1 ]
Hu, Yiguan [1 ]
Tian, Yangchao [1 ]
Kan, Ya [1 ]
机构：
[1] Univ of Science and Technology of, China, Hefei, China
来源：
Chinese Journal of Polymer Science (English Edition) | 1998年 / 16卷 / 04期
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页码：304 / 309
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