Reaction of H2O2 with Suspensions of Np(OH)4 and Pu(OH)4 in Alkali Solution

被引：0
|
作者：
Shilov, V. P.
Astafurova, L. N.
Garnov, A. Y.
Krot, N. N.
机构：
来源：
Radiokhimiya | / 38卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Reaction of H2O2 with suspensions of Np(OH)(4) and Pu(OH)(4) in alkali solution
    Shilov, VP
    Astafurova, LN
    Garnov, AY
    Krot, NN
    RADIOCHEMISTRY, 1996, 38 (03) : 217 - 219
  • [2] Reaction of ozone and H2O2 in NH4OH solutions and their reaction with silicon wafers
    Eom, DH
    Lim, GB
    Park, JG
    Busnaina, AA
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6A): : 3335 - 3339
  • [3] Reaction of ozone and H2O2 in NH4OH solutions and their reaction with silicon wafers
    Eom, Dae-Hong
    Lim, Geun-Bae
    Park, Jin-Goo
    Busnaina, Ahmed A.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2004, 43 (6 A): : 3335 - 3339
  • [4] Reaction of Pu(VI) with H2O2 in alkali solutions
    Shilov, VP
    Budantseva, NA
    RADIOCHEMISTRY, 1998, 40 (06) : 568 - 572
  • [5] ETCHING OF THERMALLY GROWN SIO2 BY NH4OH IN MIXTURE OF NH4OH AND H2O2 CLEANING SOLUTION
    KAIGAWA, H
    YAMAMOTO, K
    SHIGEMATSU, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7A): : 4080 - 4085
  • [6] Etching of thermally grown SiO2 by NH4OH in mixture of NH4OH and H2O2 cleaning solution
    Kaigawa, Hiroyuki, 1600, JJAP, Minato-ku, Japan (33):
  • [7] The reaction of ozone and H2O2 in ammonium hydroxide (NH4OH) solutions and their reaction with silicon wafers
    Eom, DH
    Kim, SY
    Lee, KK
    Kim, KS
    Song, HS
    Park, JG
    CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING, 2000, 99 (36): : 288 - 295
  • [8] REACTION OH + H2O2 IN PRODUCTION OF HO2 RADICALS
    HACK, W
    HOYERMAN.K
    BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1974, 78 (11): : 1266 - 1266
  • [9] RATE OF REACTION OH + OH -] H2O + O
    WESTENBE.AA
    DEHAAS, N
    JOURNAL OF CHEMICAL PHYSICS, 1973, 58 (10): : 4066 - 4071
  • [10] The •OH Radical Yield in the H2O2 + O3 (Peroxone) Reaction
    Fischbacher, Alexandra
    von Sonntag, Justus
    von Sonntag, Clemens
    Schmidt, Torsten C.
    ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2013, 47 (17) : 9959 - 9964
12345