NOVEL TI:LINBO3 RIDGE WAVEGUIDE LINEAR MODE CONFINEMENT MODULATOR FABRICATED BY REACTIVE ION-BEAM ETCHING.

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作者
Belanger, Michel [1 ]
Yip, Gar Lam [1 ]
机构
[1] McGill Univ, Montreal, Que, Can, McGill Univ, Montreal, Que, Can
关键词
PHOTORESISTS; -; WAVEGUIDES; OPTICAL;
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摘要
The realization of a ridge waveguide linear mode-confinement modulator using reactive ion-beam etching is discussed. With the help of a design analysis, the modulation characteristics are predicted. Along with the measured modulation characteristics, preliminary results of the calibration of ion-beam etching in Z-cut LiNbO//3 by Ar and a mixture of Ar and CHF//3 are presented. Differential etching rates of as high as 7 between photoresist and LiNbO//3 are obtained. Using the proposed design of a ridge waveguide linear modulator, a linear modulation of over 67% is measured.
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页码:1252 / 1257
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