Al etching characteristics employing helicon wave plasma

被引：0
|
作者：
机构：
[1] Jiwari, Nobuhiro
[2] Iwasawa, Hiroaki
[3] Narai, Akira
[4] Sakaue, Hiroyuki
[5] Shindo, Haruo
[6] Shoji, Tatsuo
[7] Horike, Yasuhiro
来源：
Jiwari, Nobuhiro | 1600年 / 32期
关键词：
7;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Electrical characteristics of helicon wave plasmas
    Yun, SM
    Kim, JH
    Chang, HY
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1998, 26 (02) : 159 - 166
  • [32] Dry etching of platinum films with TiN masks in an Ar/O2 helicon wave plasma
    Chiang, MC
    Pan, FM
    Cheng, HC
    Liu, JS
    Chan, SH
    Wei, TC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (01): : 181 - 187
  • [33] The discharge characteristics in nitrogen helicon plasma
    Zhao, Gao
    Wang, Huihui
    Si, Xinlu
    Ouyang, Jiting
    Chen, Qiang
    Tan, Chang
    PHYSICS OF PLASMAS, 2017, 24 (12)
  • [34] SiO2 etching by M=0 helicon plasma
    Nogami, H
    Ogahara, Y
    Mashimo, K
    Nakagawa, Y
    Tsukada, T
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (02) : 181 - 186
  • [35] Etching mechanism of ferroelectric film etched by helicon plasma method
    You, IK
    Yoon, SM
    Cho, SM
    Kim, KD
    Ryu, SO
    Lee, NY
    Yu, BG
    Koo, JG
    Kim, JD
    INTEGRATED FERROELECTRICS, 2002, 48 : 213 - 220
  • [36] Etching mechanism of ferroelectric film etched by helicon plasma method
    You, In-Kyu
    Yoon, Sung-Min
    Cho, Seong Mok
    Kim, Kwi Dong
    Ryu, Sang-Ouk
    Lee, Nam Yeal
    Yu, Byoung-Gon
    Koo, Jin Gun
    Kim, Jong Dae
    Integrated Ferroelectrics, 2002, 48 : 213 - 220
  • [37] HELICON - A SOLID-STATE PLASMA WAVE
    BAYNHAM, AC
    ENGINEERING, 1969, 207 (5381): : 859 - &
  • [38] The wave mode transition of argon helicon plasma
    Cui, Ruilin
    Zhang, Tianliang
    He, Feng
    Zheng, Bocong
    Ouyang, Jiting
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2024, 33 (02)
  • [39] AMPLIFICATION OF HELICON-WAVE IN A SEMICONDUCTOR PLASMA
    HSIEH, HC
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1972, 17 (11): : 1014 - 1014
  • [40] Capacitive, inductive and helicon-wave modes of operation of a helicon plasma source
    Phys Plasmas, 7 (2797):
12345