Ion-channeling and Raman scattering study of damage accumulation in silicon

被引:0
|
作者
Johnson, B.C. [1 ]
McCallum, J.C. [1 ]
机构
[1] School of Physics, University of Melbourne, Melbourne, Vic. 3010, Australia
来源
Journal of Applied Physics | 1600年 / 95卷 / 03期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
(Edited Abstract)
引用
收藏
页码:1096 / 1101
相关论文
共 50 条
  • [1] Ion-channeling and Raman scattering study of damage accumulation in silicon
    Johnson, BC
    McCallum, JC
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (03) : 1096 - 1101
  • [2] Studies of damage accumulation in 4H silicon carbide by ion-channeling techniques
    Zhang, Y
    Gao, F
    Jiang, W
    McCready, DE
    Weber, WJ
    PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5, 2005, 475-479 : 1341 - 1344
  • [3] Ion-channeling analysis of boron clusters in silicon
    Selen, LJM
    Janssen, FJJ
    van IJzendoorn, LJ
    de Voigt, MJA
    Theunissen, MJJ
    Smulders, PJM
    Eijkemans, TJ
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (09) : 4741 - 4747
  • [4] Collapse of nanocavities studied by ion-channeling and Raman spectroscopy
    Johnson, BC
    McCallum, JC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 190 : 602 - 605
  • [5] Ion channeling and Raman scattering study of self-implanted silicon
    Johnson, BC
    McCallum, JC
    COMMAD 2002 PROCEEDINGS, 2002, : 429 - 432
  • [6] Study on damage accumulation in LiAlO2 single crystal irradiated with deuterium and helium ions by ion-channeling
    Katsui, H.
    Nagata, S.
    Tsuchiya, B.
    Shikama, T.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2010, 268 (17-18) : 2735 - 2739
  • [7] Ion-channeling studies of interfaces and defect properties in silicon carbide
    Jiang, W
    Weber, WJ
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 957 - 960
  • [8] ION-CHANNELING INVESTIGATIONS OF NITROGEN IN ZIRCONIUM
    HOWE, LM
    SWANSON, ML
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1992, 64 (1-4) : 246 - 250
  • [9] INFLUENCE OF MECHANICAL DEFORMATION ON ION-CHANNELING YIELDS IN SINGLE-CRYSTAL SILICON
    BORDERS, JA
    ARNOLD, GW
    WHAN, RE
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1972, 17 (03): : 287 - &
  • [10] NUCLEAR MICROPROBE ION-CHANNELING ANALYSIS OF TOTAL DIELECTRIC ISOLATION STRUCTURES IN SILICON
    THORNTON, J
    ROBINSON, AK
    REESON, KJ
    DAVIS, J
    HEMMENT, PLF
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (09) : 890 - 895