PROCESS-COMPATIBLE ELECTRON BEAM DIRECT WRITE SYSTEM.

被引：0
|
作者：
Livesay, W.R.
Greeneich, J.S.
Wolfe, J.E.
Felker, R.J.
机构：
来源：
Solid State Technology | 1983年 / 26卷 / 09期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：137 / 139
相关论文
共 50 条
  • [1] A PROCESS-COMPATIBLE ELECTRON-BEAM DIRECT WRITE SYSTEM
    LIVESAY, WR
    GREENEICH, JS
    WOLFE, JE
    FELKER, RJ
    SOLID STATE TECHNOLOGY, 1983, 26 (09) : 137 - 139
  • [2] WAFERWRITER - A PROCESS-COMPATIBLE ELECTRON-BEAM DIRECT WRITE SYSTEM
    LIVESAY, WR
    GREENEICH, JS
    WOLFE, JE
    FELKER, RJ
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 56 - 61
  • [3] DIRECT-WRITE ELECTRON-BEAM SYSTEM
    PETRIC, P
    WOODARD, O
    SOLID STATE TECHNOLOGY, 1983, 26 (09) : 154 - 160
  • [4] Design of process-compatible biological agents
    Dean, JP
    Dervakos, GA
    COMPUTERS & CHEMICAL ENGINEERING, 1996, 20 : S67 - S72
  • [5] Progress and process improvements for multiple electron-beam direct write
    Servin, Isabelle
    Pourteau, Marie-Line
    Pradelles, Jonathan
    Essomba, Philippe
    Lattard, Ludovic
    Brandt, Pieter
    Wieland, Marco
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2017, 56 (06)
  • [6] PERFORMANCE TESTING OF THE WAFERWRITER ELECTRON-BEAM DIRECT WRITE SYSTEM
    LIVESAY, WR
    RUSSELL, JD
    HARRY, D
    HULETT, JS
    RUBIALES, AL
    WOLFE, JE
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 12 - 16
  • [7] EL-3+ ELECTRON-BEAM DIRECT WRITE SYSTEM
    PFEIFFER, HC
    BUTSCH, R
    GROVES, TR
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 7 - 10
  • [8] Resist characteristics with direct write electron beam and SCALPEL exposure system
    Sato, M
    Ohmori, K
    Ishikawa, K
    Nakayama, T
    Novembre, AE
    Ocola, LE
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 227 - 236
  • [9] HIGH-SPEED DIRECT WRITE ELECTRON-BEAM SYSTEM
    URA, F
    RISSMAN, P
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 89 - 93
  • [10] A high throughput NGL electron beam direct-write lithography system
    Parker, NW
    Brodie, AD
    McCoy, JH
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 713 - 720
12345