Polymer optical waveguides on micromachined silicon

被引：0
|
作者：
Emelli, E. [1 ]
Pozzi, F. [1 ]
机构：
[1] CSELT
来源：
CSELT Technical Reports | 2000年 / 28卷 / 01期
关键词：
Chemical resistance - Guided electromagnetic wave propagation - Micromachining - Plastic films - Reactive ion etching - Silicon wafers - Thermodynamic stability;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
We have produced and characterized integrated optical waveguides fabricated by spinning a polymer layer on a silicon substrate micromachined using the RIE (Reactive Ion Etching) technique. Waveguides produced using this simple technique have shown propagation losses at 1550 nm of less than 0.5 dB/cm, with high temperature stability and chemical resistance.
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页码：19 / 25
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