Polymer optical waveguides on micromachined silicon

被引：0

作者：

Emelli, E. ^{[1
]}

Pozzi, F. ^{[1
]}

机构：

[1] CSELT

来源：

CSELT Technical Reports | 2000年 / 28卷 / 01期

关键词：

Chemical resistance - Guided electromagnetic wave propagation - Micromachining - Plastic films - Reactive ion etching - Silicon wafers - Thermodynamic stability;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We have produced and characterized integrated optical waveguides fabricated by spinning a polymer layer on a silicon substrate micromachined using the RIE (Reactive Ion Etching) technique. Waveguides produced using this simple technique have shown propagation losses at 1550 nm of less than 0.5 dB/cm, with high temperature stability and chemical resistance.

引用

页码：19 / 25