Reactive deposition of In2O3 films on In2O3 substrates

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作者：
Muranaka, Shigetoshi [1 ]
机构：
[1] Kyoto Univ, Kyoto, Japan
来源：
Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy | 1996年 / 43卷 / 07期
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摘要：
8
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页码：930 / 933
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