Formation of TiC on cemented carbide substrate by CVD method and its application to fine hole

被引：0
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作者：
Umezawa, Akihiko
Shikata, Nobuo
Kikuchi, Kaoru
机构：
来源：
Kikai Gijutsu Kenkyusho Shoho/Journal of Mechanical Engineering Laboratory | 1988年 / 42卷 / 04期
关键词：
Metal Cutting - Metal Drawing--Dies;
D O I：
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学科分类号：
摘要：
TiC coating was deposited on cemented carbide substrates using CVD apparatus with a carrier gas(H2) and a reactant gas (TiCl4 and CH4). Thickness of TiC film and eta phase zone formed at the interface between TiC film and substrate were investigated. Then, TiC coating was applied to the inside surface of fine holes. The characteristics of TiC film were evaluated by cutting and wire drawing tests. The results obtained are presented.
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页码：169 / 176
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