Making the cleaner greener

被引：0

作者：

Bergman, E.

Lagrange, S.

Claes, M.

机构：

来源：

| 2001年 / Angel Buiness Communications Ltd.卷 / 23期

关键词：

Boundary layers - Diffusion in solids - Environmental impact - Fluorine compounds - Ozone - Photoresists - Silicon wafers;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Pre-diffusion wafer cleaning by FluorOzone process was investigated in comparison with the conventional 4-chem clean process. The process used hydrogen fluoride (HF) with HydrOzone for cleaning the materials surrounding the wafer surface. FluorOzone technique was capable of organic and particle removal, strip & regeneration of fresh chemical oxide as efficiently as the conventional technique.

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