Nitrogen ion beam induced recrystallization of AlNx films

被引：0
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作者：
Kobayashi, Kenzo [1 ]
Namba, Susumu [1 ]
Fujihana, Takanobu [1 ]
Dai, Yisheng [1 ]
Iwaki, Masaya [1 ]
机构：
[1] Osaka Univ, Japan
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1600年 / B33卷 / 1-4期
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摘要：
Aluminum Compounds
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页码：689 / 692
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