Characterization of low-pressure chemical vapor deposited polycrystalline silicon thin-film transistors by low-frequency noise measurements

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作者：
Dimitriadis, Charalabos A. [1 ]
Brini, Jean [1 ]
Kamarinos, Georges [1 ]
Ghibaudo, Gerard [1 ]
机构：
[1] ENSERG, Grenoble, France
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 01期
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页码：72 / 77
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