Low-temperature growth and measurement of oxygen in reactively sputtered AlN thin films

被引：0
|
作者：
Kumar, Sunil [1 ]
Tansley, T.L. [1 ]
机构：
[1] Macquarie Univ, Sydney
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 8 A期
关键词：
Aluminum compounds - Film growth - Low temperature operations - Microstructure - Nitrides - Oxygen - Rutherford backscattering spectroscopy - Scanning electron microscopy - Sputter deposition - Stoichiometry - Substrates - X ray photoelectron spectroscopy;
D O I：
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学科分类号：
摘要：
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页码：4154 / 4158
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