Resist heating in cell projection electron beam direct writing

被引：0
|
作者：
Nakajima, Ken [1 ]
Hirasawa, Satomi [1 ]
Onoda, Naka [1 ]
Nozue, Hirosi [1 ]
机构：
[1] NEC Corp, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 5 A期
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页码：2912 / 2917
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