共 50 条
- [43] Numerical modeling of silicon etching in CF4/O2 plasma-chemical system 2004 24TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS, PROCEEDINGS, VOLS 1 AND 2, 2004, : 475 - 478
- [45] Surface characterization of nickel alloy plasma-treated by O2/CF4 mixture Chan-Park, M.B. (mbechan@ntu.edu.sg), 1979, VSP BV (17):
- [46] Using CF4/Ar/O2 plasma to modify surface of fused quartz components Shao, Y. (zineshao@163.com), 1600, Editorial Office of High Power Laser and Particle Beams, P.O. Box 919-805, Mianyang, 621900, China (26):
- [47] DIELECTRIC BEHAVIOR OF O2/CF4 PLASMA ETCHED POLYIMIDE EXPOSED TO HUMID ENVIRONMENTS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (02): : 291 - 300
- [50] OES Diagnostics of HMDSO/O2/CF4 Microwave Plasma for SiOCxFy Films Deposition LASER AND PLASMA APPLICATIONS IN MATERIALS SCIENCE, 2011, 227 : 152 - +