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- [43] Fourier-transform infrared and optical emission spectroscopy of CF4/O2/Ar mixtures in an inductively coupled plasma Cruden, B.A. (bcruden@mail.arc.nasa.gov), 1600, American Institute of Physics Inc. (93):
- [46] Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2022, 40 (03):
- [48] Using CF4/Ar/O2 plasma to modify surface of fused quartz components Shao, Y. (zineshao@163.com), 1600, Editorial Office of High Power Laser and Particle Beams, P.O. Box 919-805, Mianyang, 621900, China (26):