ANODIC NITRIDATION OF SILICON AND SILICON DIOXIDE.

被引：0
作者：
Wong, S.Simon [1 ]
Oldham, William G. [1 ]
机构：
[1] Hewlett-Packard Lab, Palo Alto, CA,, USA, Hewlett-Packard Lab, Palo Alto, CA, USA
来源：
IEEE Transactions on Electron Devices | 1985年 / ED-32卷 / 05期
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D O I：
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学科分类号：
摘要：
24
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页码：978 / 982
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