NON HYDROGENATED MATERIALS FOR X-RAY MASKS (Si3N4 AND SiC).

被引：1
|
作者：
Madouri, A. [1 ]
Gosnet, A.M. [1 ]
Bourneix, J. [1 ]
机构：
[1] CNRS, Bagneux, Fr, CNRS, Bagneux, Fr
来源：
Microelectronic Engineering | 1987年 / 6卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(87)90044-X
中图分类号：
学科分类号：
摘要：
10
引用
收藏
页码：241 / 245
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