Effects of substrate temperature and oxygen partial pressure on the properties of sputtered zirconium titanate thin films

被引：0
|
作者：
机构：
[1] Chang, De-An
[2] Lin, Pang
[3] Tseng, Tseung-Yuen
来源：
Chang, De-An | 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
40;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [31] Effect of argon gas pressure and substrate temperature on magnetic properties of magnetron sputtered SmCo thin films
    Wang, YH
    Sood, DK
    Ghantasala, MK
    NANO- AND MICROTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS, 2002, 4936 : 394 - 402
  • [32] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS
    CRAIG, S
    HARDING, GL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02): : 205 - 215
  • [33] Influence of hydrogen and oxygen on the structure and properties of sputtered magnesium zirconium oxynitride thin films
    Kim, Jekyung
    Bauers, Sage R.
    Khan, Imran S.
    Perkins, John
    Park, Bo-In
    Talley, Kevin R.
    Kim, Daehan
    Zakutayev, Andriy
    Shin, Byungha
    JOURNAL OF MATERIALS CHEMISTRY A, 2020, 8 (18) : 9364 - 9372
  • [34] The effect of substrate temperature and oxygen partial pressure on the properties of nanocrystalline copper oxide thin films grown by pulsed laser deposition
    Farhad, Syed Farid Uddin
    DATA IN BRIEF, 2021, 34
  • [35] Effect of substrate temperature and oxygen partial pressure on microstructure and optical properties of pulsed laser deposited yttrium oxide thin films
    Mishra, Maneesha
    Kuppusami, P.
    Sairam, T. N.
    Singh, Akash
    Mohandas, E.
    APPLIED SURFACE SCIENCE, 2011, 257 (17) : 7665 - 7670
  • [36] RF-sputtered vanadium oxide thin films: Effect of oxygen partial pressure on structural and electrochemical properties
    Park, YJ
    Park, NG
    Ryu, KS
    Chang, SH
    Park, SC
    Yoon, SN
    Kim, DK
    BULLETIN OF THE KOREAN CHEMICAL SOCIETY, 2001, 22 (09) : 1015 - 1018
  • [37] Highly conductive AZO thin films obtained by rationally optimizing substrate temperature and oxygen partial pressure
    Zeng, Yong
    Fang, Zhiqiang
    Ning, Honglong
    Zhu, Feng
    Liu, Xianzhe
    Tao, Ruiqiang
    Hu, Shiben
    Yao, Rihui
    Li, Zhengcao
    Xu, Miao
    Wang, Lei
    Lan, Linfeng
    Peng, Junbiao
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2017, 644 (01) : 190 - 196
  • [38] Effects of Oxygen Partial Pressure on the Sputtered Hafnium Oxide Thin Films for Resistive Random-Access Memory
    Xie, Zhongliang
    Lai, Yunfeng
    OPTICAL, ELECTRONIC MATERIALS AND APPLICATIONS II, 2012, 529 : 49 - 52
  • [39] Oxygen partial pressure effects on the magnetron sputtered WO3 films
    Muglu, G. Merhan
    Gur, E.
    INTERNATIONAL PHYSICS CONFERENCE AT THE ANATOLIAN PEAK (IPCAP2016), 2016, 707
  • [40] Effects of substrate temperature on the magnetic properties of As-sputtered FeTaN films
    Bae, S
    Kim, CS
    Jeong, JH
    Ryu, SR
    Kim, HJ
    Nam, SE
    Kim, HJ
    IEEE TRANSACTIONS ON MAGNETICS, 2001, 37 (04) : 2291 - 2293
12345