Thin RF sputtered and thermal Ta2O5 on Si for high density DRAM application

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Bulgarian Academy of Sciences, Inst. Solid-Stt. Phys., 72 T., Sofia, Bulgaria ^{[1
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Microelectron. Reliab. | / 8卷 / 1185-1217期

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The contributions of my co-authors Dr. T. Dimitrova and Ph.D. student D. Spassov are gratefully acknowledged. This work was partly supported by the Bulgarian Ministry of Science and Education in the frame of Project No. 537;

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