Metallorganic chemical vapor deposition of AlGaAs using tertiarybuthylarsine

被引：0
|
作者：
机构：
[1] Ishikawa, Hironori
[2] Izumiya, Toshihide
[3] Mashita, Masao
来源：
Ishikawa, Hironori | 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Metalorganic chemical vapor deposition of AlGaAs using tertiarybutylarsine
    Ishikawa, H
    Izumiya, T
    Mashita, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12A): : 6377 - 6378
  • [2] Electroenhanced metallorganic chemical vapor deposition of copper films
    Kuo, Lin
    Lee, Chiapyng
    Chen, Gene
    Liu, Kou-Liang
    Yen, Yee-Wen
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2007, 10 (05) : D51 - D54
  • [3] A kinetic model for the metallorganic chemical vapor deposition of CdTe
    Cavallotti, C
    Bertani, V
    Masi, M
    Carrà, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (09) : 3277 - 3284
  • [4] Fabrication of tungsten films by metallorganic chemical vapor deposition
    Yi Li
    Jin-pu Li
    Cheng-chang Jia
    Xue-quan Liu
    International Journal of Minerals, Metallurgy, and Materials, 2012, 19 : 1149 - 1153
  • [5] Fabrication of tungsten films by metallorganic chemical vapor deposition
    Yi Li1
    InternationalJournalofMineralsMetallurgyandMaterials, 2012, 19 (12) : 1149 - 1153
  • [6] Fabrication of tungsten films by metallorganic chemical vapor deposition
    Li, Yi
    Li, Jin-pu
    Jia, Cheng-chang
    Liu, Xue-quan
    INTERNATIONAL JOURNAL OF MINERALS METALLURGY AND MATERIALS, 2012, 19 (12) : 1149 - 1153
  • [7] AlGaAs/GaAs heterojunction bipolar transistors with reduced base-collector capacitance fabricated using selective metallorganic chemical vapor deposition
    Son, Jeong-Hwan
    Kim, Chang-Tae
    Hong, Song-Cheol
    Kwon, Young-Se
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (2 B): : 1085 - 1088
  • [8] Metallorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition
    Van Buskirk, Peter C.
    Bilodeau, Steve M.
    Roeder, Jeffrey F.
    Kirlin, Peter S.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2520 - 2525
  • [9] Preparation of zirconia thin films by metallorganic chemical vapor deposition using ultrasonic nebulization
    Seoul Natl Univ, Seoul, Korea, Republic of
    J Mater Res, 10 (2583-2587):
  • [10] Chemical vapor deposition of CeO2 films using a liquid metallorganic source
    Ohno, H
    Sakurai, K
    Tagui, K
    Morita, T
    Suzuki, S
    Ishibashi, K
    Yamamoto, Y
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (03) : G87 - G89
12345