Si ETCHING WITH A HOT SF6 BEAM AND THE ETCHING MECHANISM.

被引：0

作者：

Suzuki, Keizo ^{[1
]}

Ninomiya, Ken ^{[1
]}

Nishimatsu, Shigeru ^{[1
]}

Okada, Osami ^{[1
]}

机构：

[1] Hitachi Ltd, Kokubunji, Jpn, Hitachi Ltd, Kokubunji, Jpn

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes | 1987年 / 26卷 / 01期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：166 / 173

共 50 条

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