Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering

被引：7
|
作者：
Pascual, E. [1 ]
Martinez, E. [1 ]
Esteve, J. [1 ]
Lousa, A. [1 ]
机构：
[1] Universitat de Barcelona, Barcelona, Spain
来源：
Diamond and Related Materials | 1999年 / 8卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：402 / 405
相关论文
共 50 条
  • [31] Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method
    Bae, Kyung Eun
    Park, Jong Keuk
    Lee, Wook Seong
    Baik, Young Joon
    KOREAN JOURNAL OF METALS AND MATERIALS, 2014, 52 (12): : 969 - 974
  • [32] The influence of residual gas on boron carbide thin films prepared by magnetron sputtering
    Jiang, Hui
    Zhu, Jingtao
    Huang, Qiushi
    Xu, Jing
    Wang, Xiaoqiang
    Wang, Zhanshan
    Pfauntsch, Slawka
    Michette, Alan
    APPLIED SURFACE SCIENCE, 2011, 257 (23) : 9946 - 9952
  • [33] Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide
    Guruz, MU
    Dravid, VP
    Chung, YW
    THIN SOLID FILMS, 2002, 414 (01) : 129 - 135
  • [34] Effects of Substrate Bias and Ar Pressure on Growth of α-phase in W Thin Films Deposited by RF Magnetron Sputtering
    Ahn, Seon Mi
    Jang, Gil Su
    Kim, Du Yun
    Hwang, Nong-Moon
    ELECTRONIC MATERIALS LETTERS, 2023, 19 (03) : 298 - 308
  • [35] Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
    Singh, Sukhvinder
    Srinivasa, R. S.
    Major, S. S.
    THIN SOLID FILMS, 2007, 515 (24) : 8718 - 8722
  • [36] Optical characterization of ZnO thin films deposited by RF magnetron sputtering method
    TANG Ning
    Science in China(Series E:Technological Sciences), 2009, (08) : 2200 - 2203
  • [37] Protective YSZ-based thin films deposited by RF magnetron sputtering
    Shaula, A. L.
    Oliveira, J. C.
    Kolotygin, V. A.
    Louro, C.
    Kharton, V. V.
    Cavaleiro, A.
    VACUUM, 2009, 83 (10) : 1266 - 1269
  • [38] Characteristics of SrTiO3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures
    Wang, ZC
    Kugler, V
    Helmersson, U
    Evangelou, EK
    Konofaos, N
    Nakao, S
    Jin, P
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 2002, 82 (08): : 891 - 903
  • [39] Effects of Substrate Bias and Ar Pressure on Growth of α-phase in W Thin Films Deposited by RF Magnetron Sputtering
    Seon Mi Ahn
    Gil Su Jang
    Du Yun Kim
    Nong-Moon Hwang
    Electronic Materials Letters, 2023, 19 : 298 - 308
  • [40] Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
    Dong Hyun Hwang
    Jung Hoon Ahn
    Kwun Nam Hui
    Kwan San Hui
    Young Guk Son
    Nanoscale Research Letters, 7
12345