LATERAL SOLID-PHASE EPITAXY OF VACUUM-DEPOSITED AMORPHOUS Si FILM OVER RECESSED SiO2 PATTERNS.

被引：0
|
作者：
Kunii, Yasuo [1 ]
Tabe, Michiharu [1 ]
机构：
[1] NTT, Atsugi Electrical Communication, Lab, Atsugi, Jpn, NTT, Atsugi Electrical Communication Lab, Atsugi, Jpn
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1985年 / 24卷 / 05期
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摘要：
SEMICONDUCTING SILICON
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页码：352 / 354
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