Application of Ion Plating to Obtain Conductive and Transparent Thin Films of Indium and Tin Oxides.

We study the realization by reactive ion plating of transparent and conductive thin films. Indium and tin are evaporated separately by Joule effect in presence of an rf disharge obtained in pure oxygen. The proportions of indium and tin oxides in the films are determined by controlling the rate of evaporation of these two metals by spectroscopic analysis of the light emitted in the discharge. The substrates are heated, in situ, during the deposition cycle, and thus all annealing are avoided. The electrical resistivity is 5. 10** minus **6 OMEGA . m. The transparency of a film 0. 5 mu m thick is greater than 85% in the visible region.