Deposition kinetics of Al2O3 from AlCl3-CO2-H2-HCl gas mixtures by thermal CVD in a hot-wall reactor

被引：0
作者：
Schierling, M. [1 ,2 ]
Zimmermann, E. [1 ]
Neuschütz, D. [1 ]
机构：
[1] Lehrst. fur Theor. Huttenkunde, Rheinisch-Westfalische TH Aachen, 52056 Aachen, Germany
[2] Vacuumschmelze, 63450 Hanau, Germany
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 1卷 / 08期
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页码：8 / 85
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