Ion-beam deposition with positive and negative ions

被引：0
|
作者：
Fujii, K. [1 ]
Horino, Y. [1 ]
Tsubouchi, N. [1 ]
Enders, B. [1 ]
Chayahara, A. [1 ]
Kinomura, A. [1 ]
机构：
[1] Osaka Natl Research Inst, Osaka, Japan
来源：
Surface and Coatings Technology | 1996年 / 84卷 / 1 -3 pt 2期
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页码：544 / 549
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