X-ray diffraction analysis of ITO films prepared by magnetron reactive sputtering

被引:0
|
作者
Mao, Xinhui
Chen, Guoping
机构
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Properties of ITO films prepared by reactive magnetron sputtering
    Kleinhempel, Ronny
    Kaune, Gunar
    Herrmann, Matthias
    Kupfer, Hartmut
    Hoyer, Walter
    Richter, Frank
    MICROCHIMICA ACTA, 2006, 156 (1-2) : 61 - 67
  • [2] Properties of ITO films prepared by reactive magnetron sputtering
    Ronny Kleinhempel
    Gunar Kaune
    Matthias Herrmann
    Hartmut Kupfer
    Walter Hoyer
    Frank Richter
    Microchimica Acta, 2006, 156 : 61 - 67
  • [3] Measurement of residual stresses by X-ray diffraction techniques in pyrite films prepared by magnetron sputtering
    Luan, Z. J.
    Huang, Y. L.
    Yao, D. W.
    Meng, L.
    MATERIALS RESEARCH INNOVATIONS, 2011, 15 (05) : 334 - 339
  • [4] Characterization of low pressure annealed ITO/Au/ITO films prepared by reactive magnetron sputtering
    Kim, Daeil
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 493 (1-2) : 208 - 211
  • [5] X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
    Lapshin, A. E.
    Karzin, V. V.
    Shapovalov, V. I.
    Baikov, P. B.
    GLASS PHYSICS AND CHEMISTRY, 2016, 42 (01) : 116 - 117
  • [6] X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
    A. E. Lapshin
    V. V. Karzin
    V. I. Shapovalov
    P. B. Baikov
    Glass Physics and Chemistry, 2016, 42 : 116 - 117
  • [7] Properties of ITO films prepared by rf magnetron sputtering
    El Akkad, F.
    Punnoose, A.
    Prabu, G.
    Applied Physics A: Materials Science and Processing, 2000, 71 (02): : 157 - 160
  • [8] Properties of ITO films prepared by rf magnetron sputtering
    F. El Akkad
    A. Punnoose
    G. Prabu
    Applied Physics A, 2000, 71 (2) : 157 - 160
  • [9] Properties of ITO films prepared by rf magnetron sputtering
    El Akkad, F
    Punnoose, A
    Prabu, G
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 71 (02): : 157 - 160
  • [10] Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering
    Meng, LJ
    dosSantos, MP
    THIN SOLID FILMS, 1996, 289 (1-2) : 65 - 69