Cl2 reactive ion etching for gate recessing of AlGaN/GaN field-effect transistors

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作者：
Chen, Ching-Hui
Keller, Stacia
Haberer, Elaine D.
Zhang, Lidong
DenBaars, Steven P.
Hu, Evelyn L.
Mishra, Umesh K.
Wu, Yifeng
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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | / 17卷
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页码：2755 / 2758
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