HIGH CURRENT, HIGH VOLTAGE OXYGEN ION IMPLANTER.

被引：0

作者：

Ruffell, John P. ^{[1
]}

Douglas-Hamilton, D.H. ^{[1
]}

Kaim, R.E. ^{[1
]}

Izumi, K. ^{[1
]}

机构：

[1] Eaton Corp, Beverly, MA, USA, Eaton Corp, Beverly, MA, USA

来源：

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期

关键词：

D O I：

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中图分类号：

学科分类号：

摘要：

SILICON AND ALLOYS

引用

页码：229 / 234

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