HIGH CURRENT, HIGH VOLTAGE OXYGEN ION IMPLANTER.

被引：0
|
作者：
Ruffell, John P. [1 ]
Douglas-Hamilton, D.H. [1 ]
Kaim, R.E. [1 ]
Izumi, K. [1 ]
机构：
[1] Eaton Corp, Beverly, MA, USA, Eaton Corp, Beverly, MA, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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摘要：
SILICON AND ALLOYS
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页码：229 / 234
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