Plasma deposition of thin fluorocarbon films for increased membrane hemocompatibility

被引：0
|
作者：
Schue, F. [1 ]
Clarotti, G. [1 ]
Ait Ben Aoumar, A. [1 ]
Sledz, J. [1 ]
Mas, A. [1 ]
Geckeler, K.E. [1 ]
Gopel, W. [1 ]
Orsetti, A. [1 ]
机构：
[1] Universite de Montpellier II, Montpellier, France
来源：
Macromolecular reports | 1994年 / 31卷 / Suppl 6-7期
关键词：
Argon plasma - Contact angle measurement - Ethylene oxide - Filtering properties - Mass variations - Membrane homocompatibility - Perfluorohexane - Plasma deposition - Surface profilometry - Thin fluorocarbon films;
D O I：
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摘要：
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页码：1161 / 1175
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