Visible photoluminescence in hydrogenated amorphous silicon grown in microwave plasma from SiH4 strongly diluted with He

被引：0
|
作者：
Dian, J.
Valenta, J.
Hala, J.
Poruba, A.
Horvath, P.
Luterova, K.
Gregora, I.
Pelant, I.
机构：
来源：
Journal of Applied Physics | / 86卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Amorphous silicon films from dichlorosilane and SiH4 for solar cells
    Payne, AM
    Wagner, S
    THIN FILMS FOR PHOTOVOLTAIC AND RELATED DEVICE APPLICATIONS, 1996, 426 : 47 - 52
  • [22] Visible photoluminescence from low temperature deposited hydrogenated amorphous silicon nitride
    Aydmh, A
    Serpenguzel, A
    Vardar, D
    SOLID STATE COMMUNICATIONS, 1996, 98 (04) : 273 - 277
  • [23] VISIBLE PHOTOLUMINESCENCE FROM HYDROGENATED SILICON PARTICLES SUSPENDED IN A SILANE PLASMA
    COURTEILLE, C
    DORIER, JL
    DUTTA, J
    HOLLENSTEIN, C
    HOWLING, AA
    STOTO, T
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (01) : 61 - 66
  • [24] Measurement and calculation of SiH2 radical density in SiH4 and Si2H6 plasma for the deposition of hydrogenated amorphous silicon thin films
    Shirafuji, Tatsuru
    Tachibana, Kunihide
    Matsui, Yasuji
    1600, JJAP, Minato-ku, Japan (34):
  • [25] PLASMA CHEMISTRY OF HE/O2/SIH4 AND HE/N2O/SIH4 MIXTURES FOR REMOTE PLASMA-ACTIVATED CHEMICAL-VAPOR-DEPOSITION OF SILICON DIOXIDE
    KUSHNER, MJ
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (11) : 6538 - 6553
  • [26] Fast deposition of microcrystalline silicon using high-density SiH4 microwave plasma
    Shirai, H
    Sakuma, Y
    Moriya, Y
    Fukai, C
    Ueyama, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (12A): : 6629 - 6635
  • [27] Fast deposition of microcrystalline silicon using high-density SiH4 microwave plasma
    Shirai, Hajime
    Sakuma, Yoshikazu
    Moriya, Yoshimizu
    Fukai, Chisato
    Ueyama, Hiroyuki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (12 A): : 6629 - 6635
  • [28] Plasma chemistry of He/O2/SiH4 and He/N2O/SiH4 mixtures for remote plasma-activated chemical-vapor deposition of silicon dioxide
    Kushner, Mark J.
    1600, (74):
  • [29] Photoluminescence of silicon quantum dots in silicon nitride grown by NH3 and SIH4 -: art. no. 091908
    Kim, BH
    Cho, CH
    Kim, TW
    Parka, NM
    Sung, GY
    Park, SJ
    APPLIED PHYSICS LETTERS, 2005, 86 (09) : 1 - 3
  • [30] In situ micro Raman investigation of the laser crystallization in Si thin films plasma enhanced chemical vapor deposition-grown from He-diluted SiH4
    Santato, C
    Mattei, G
    Ruihua, W
    Mecarini, F
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (10) : 5366 - 5372
12345