Raman scattering study of lead zirconate titanate thin films prepared on silicon substrates by radio frequency magnetron sputtering

被引:0
作者
机构
来源
| 1600年 / American Inst of Physics, Woodbury, NY, USA卷 / 74期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
[31]   Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering [J].
Xiao, Z. H. ;
Xia, X. F. ;
Xu, S. J. ;
Luo, Y. P. ;
Zhong, W. ;
Ou, H. ;
Jiang, E. S. .
PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON ADVANCED DESIGN AND MANUFACTURING ENGINEERING, 2015, 39 :827-832
[32]   Ellipsometric study of a-Be3N2 thin films prepared by radio frequency magnetron sputtering [J].
Khoshman, J. M. ;
Jennings, W. D. ;
Kordesch, M. E. .
APPLIED SURFACE SCIENCE, 2009, 255 (12) :6190-6194
[33]   Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering [J].
Nosaka, T ;
Yoshitake, M ;
Okamoto, A ;
Ogawa, S ;
Nakayama, Y .
THIN SOLID FILMS, 1999, 348 (1-2) :8-13
[34]   Electrooptic properties of lead zirconate titanate films prepared on silicon substrate [J].
Kondo, Masao ;
Sato, Keisuke ;
Ishii, Masatoshi ;
Wakiya, Naoki ;
Shinozaki, Kazuo ;
Kurihara, Kazuaki .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (9B) :7516-7519
[35]   Electrooptic properties of lead zirconate titanate films prepared on silicon substrate [J].
Kondo, Masao ;
Sato, Keisuke ;
Ishii, Masatoshi ;
Wakiya, Naoki ;
Shinozaki, Kazuo ;
Kurihara, Kazuaki .
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (9 B) :7516-7519
[36]   Lead zirconate titanate thin films prepared with different types of seeds: A comparison study [J].
Wu, A ;
Vilarinho, PM ;
Salvado, IMM .
ADVANCED MATERIALS FORUM II, 2004, 455-456 :50-55
[37]   Tailored stoichiometries of silicon carbonitride thin films prepared by combined radio frequency magnetron sputtering and ion beam synthesis [J].
Bruns, M ;
Geckle, U ;
Trouillet, V ;
Rudolphi, M ;
Baumann, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (04) :1114-1119
[38]   Nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering [J].
Gonçalves, C ;
Charvet, S ;
Zeinert, A ;
Clin, M ;
Zellama, K .
THIN SOLID FILMS, 2002, 403 :91-96
[39]   Silicon dioxide electret thin films prepared by magnetron sputtering [J].
Minami, T ;
Toda, F ;
Utsubo, T ;
Miyata, T ;
Ohbayashi, Y .
PRICM 4: FORTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, VOLS I AND II, 2001, :1783-1785
[40]   Structural and electrical properties of antiferroelectric lead zirconate thin films prepared by reactive magnetron co-sputtering [J].
K YAMAKAWA ;
K. WA GACHIGI ;
S TROLIER-McKINSTRY ;
J. P DOUGHERTY .
Journal of Materials Science, 1997, 32 :5169-5176