Raman scattering study of lead zirconate titanate thin films prepared on silicon substrates by radio frequency magnetron sputtering

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| 1600年 / American Inst of Physics, Woodbury, NY, USA卷 / 74期
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[1]   RAMAN-SCATTERING STUDY OF LEAD-ZIRCONATE-TITANATE THIN-FILMS PREPARED ON SILICON SUBSTRATES BY RADIO-FREQUENCY MAGNETRON SPUTTERING [J].
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WANG, L ;
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LEVY, F ;
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[2]   FERROELECTRIC LEAD ZIRCONATE TITANATE THIN-FILMS BY RADIO-FREQUENCY MAGNETRON SPUTTERING [J].
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[8]   Preparation and ferroelectric properties of lead zirconate titanate thin films by RF magnetron sputtering [J].
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Sugiura, M ;
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