Growth and characterization of Ga2Se3/GaAs(1 0 0) epitaxial thin films
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Ueno, K.
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Department of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, JapanDepartment of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
Ueno, K.
[1
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Kawayama, M.
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Department of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, JapanDepartment of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
Kawayama, M.
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Dai, Z.R.
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Dept. of Mat. Sci. and Engineering, 311 Roberts Hall, University of Washington, Box 352120, Seattle, WA 98105-2120, United StatesDepartment of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
Dai, Z.R.
[2
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Koma, A.
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Department of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, JapanDepartment of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
Koma, A.
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Ohuchi, F.S.
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Dept. of Mat. Sci. and Engineering, 311 Roberts Hall, University of Washington, Box 352120, Seattle, WA 98105-2120, United StatesDepartment of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
Ohuchi, F.S.
[2
]
机构:
[1] Department of Chemistry, Univ. Tokyo, 7-3-1 Hongo, B., Tokyo, Japan
[2] Dept. of Mat. Sci. and Engineering, 311 Roberts Hall, University of Washington, Box 352120, Seattle, WA 98105-2120, United States