0. 1% ULTRA-UNIFORMITY IN ELECTROSTATICALLY SCANNED ION IMPLANTATION SYSTEMS.

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作者：
McGuire, Edward [1 ]
机构：
[1] Fab-M Corp, Sunnyvale, CA, USA, Fab-M Corp, Sunnyvale, CA, USA
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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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页码：431 / 432
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