Heat treatment of amorphous and polycrystalline silicon thin films with high-pressure H2O vapor

被引：0
|
作者：
Sameshima, T. [1 ]
Satoh, M. [1 ]
Sakamoto, K. [1 ]
Ozaki, K. [1 ]
Saitoh, K. [1 ]
机构：
[1] Tokyo Univ of Agriculture and, Technology, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 08期
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页码：4254 / 4257
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