InP and InAlP self-assembled quantum dots grown by metalorganic chemical vapor deposition

被引:0
|
作者
Ryou, Jae-Hyun [1 ]
Dupuis, Russell D. [1 ]
Reddy, C.V. [1 ]
Narayanamurti, Venkatesh [1 ]
Mathes, David T. [1 ]
Hull, Robert [1 ]
机构
[1] Univ of Texas at Austin, Austin, United States
关键词
Luminescence - Metallorganic chemical vapor deposition - Semiconducting gallium arsenide - Semiconducting indium phosphide - Semiconductor growth - Substrates;
D O I
暂无
中图分类号
学科分类号
摘要
We report the characteristics of InP self-assembled quantum dots embedded in In0.5Al0.5P on GaAs substrates and InxAl1-xP self-assembled quantum dots on GaP substrates grown by metalorganic chemical vapor deposition. InP quantum dots show increased average dot sizes and decreased dot densities, as the growth temperature increases from 475 C to 600 C. At 650 C, however, dramatically smaller and densely distributed quantum dots are formed. The InP quantum dots grown at 650 C are dislocation-free `coherent' self-assembled quantum dots with an average size of approximately 20 nm (height) and a density of approximately 1.5×108 mm-2. These InP quantum dots have broad range of luminescence corresponding to red or orange in the visible spectrum. InAlP quantum dots on GaP have smaller sizes and higher densities than InP dots on In0.5Al0.5P.
引用
收藏
页码:223 / 226
相关论文
共 50 条
  • [1] InP and InAlP self-assembled quantum dots grown by metalorganic chemical vapor deposition
    Ryou, JH
    Dupuis, RD
    Reddy, CV
    Narayanamurti, V
    Mathes, DT
    Hull, R
    2000 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2000, : 223 - 226
  • [2] Growth of ternary InAlP and InGaP self-assembled quantum dots by metalorganic chemical vapor deposition
    J. H. Ryou
    R. D. Dupuis
    Journal of Electronic Materials, 2003, 32 : 18 - 22
  • [3] Growth of ternary InAlP and InGaP self-assembled quantum dots by metalorganic chemical vapor deposition
    Ryou, JH
    Dupuis, RD
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (01) : 18 - 22
  • [4] Self-assembled III-phospide quantum dots grown by metalorganic chemical vapor deposition
    Ryou, JH
    Chowdhury, U
    Dupuis, RD
    Reddy, CV
    Narayanamurti, V
    Mathes, DT
    Hull, R
    SELF-ORGANIZED PROCESSES IN SEMICONDUCTOR ALLOYS, 2000, 583 : 39 - 44
  • [5] Multilayer GaSb/GaAs self-assembled quantum dots grown by metalorganic chemical vapor deposition
    Motlan
    Butcher, KSA
    Goldys, EM
    Tansley, TL
    MATERIALS CHEMISTRY AND PHYSICS, 2003, 81 (01) : 8 - 10
  • [6] Effect of the InAlGaP matrix on the growth of self-assembled InP quantum dots by metalorganic chemical vapor deposition
    Zhang, XB
    Heller, RD
    Noh, MS
    Dupuis, RD
    Walter, G
    Holonyak, N
    APPLIED PHYSICS LETTERS, 2003, 83 (07) : 1349 - 1351
  • [7] Nanometer-scale InGaN self-assembled quantum dots grown by metalorganic chemical vapor deposition
    Institute of Industrial Science, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo, 106-8558, Japan
    Appl Phys Lett, 3 (383-385):
  • [8] InGaN self-assembled quantum dots grown by metalorganic chemical-vapor deposition with indium as the antisurfactant
    Zhang, J
    Hao, M
    Li, P
    Chua, SJ
    APPLIED PHYSICS LETTERS, 2002, 80 (03) : 485 - 487
  • [9] Nanometer-scale InGaN self-assembled quantum dots grown by metalorganic chemical vapor deposition
    Tachibana, K
    Someya, T
    Arakawa, Y
    APPLIED PHYSICS LETTERS, 1999, 74 (03) : 383 - 385
  • [10] Tuning the morphology of InP self-assembled quantum structures grown on InAIP surfaces by metalorganic chemical vapor deposition
    Zhang, XB
    Ryou, JH
    Dupuis, RD
    Walter, G
    Holonyak, N
    APPLIED PHYSICS LETTERS, 2005, 86 (23) : 1 - 3