Evaluation of the waveguide effect in proximity x-ray lithography using an optical trace method

被引：0
|
作者：
机构：
[1] Ogawa, Taro
[2] Murayama, Seiichi
[3] Ito, Masaaki
[4] Matsuzaka, Takashi
来源：
Ogawa, Taro | 1600年 / JJAP, Minato-ku, Japan卷 / 34期
关键词：
X ray lithography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] X-RAY MASK FABRICATION USING ADVANCED OPTICAL LITHOGRAPHY
    TSUBOI, S
    SUZUKI, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2994 - 2996
  • [22] Printing characteristics of proximity X-ray lithography and comparison with optical lithography for 100-nm node and below
    Hasegawa, M
    Nakayama, Y
    Yamaguchi, K
    Terasawa, T
    Matsui, Y
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 96 - 104
  • [23] Evaluation of the effective image blurring factors in the synchrotron proximity x-ray lithography simulation
    Seo, Y
    Kim, O
    MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 64 - 65
  • [24] X-ray phase-shift mask for proximity X-ray lithography with synchrotron radiation
    Ezaki, M
    Murooka, K
    PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 462 - 471
  • [25] Overlay and critical dimension control in proximity x-ray lithography
    Fujii, K
    Tanaka, Y
    Suzuki, K
    Iwamoto, T
    Tsuboi, S
    Matsui, Y
    NEC RESEARCH & DEVELOPMENT, 2001, 42 (01): : 27 - 31
  • [26] Mask and wafer inspection and cleaning for Proximity X-ray Lithography
    Leavey, J
    Mangat, PJS
    EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 179 - 188
  • [27] Overlay and critical dimension control in proximity x-ray lithography
    Fujii, K.
    Tanaka, Y.
    Suzuki, K.
    Iwamoto, T.
    Tsuboi, S.
    Matsui, Y.
    NEC Research and Development, 2001, 42 (01): : 27 - 31
  • [28] Extendibility of proximity x-ray lithography to 25 nm and below
    Toyota, E
    Washio, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2979 - 2983
  • [29] New results in high energy proximity x-ray lithography
    Khan, M
    Han, G
    Maldonado, J
    Cerrina, F
    EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 176 - 181
  • [30] Mask-error factor in proximity x-ray lithography
    Fujii, K
    Suzuki, K
    Matsui, Y
    MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 58 - 59
12345